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nuntium Industry

  • M. DC stridentia tingunt aera membrana dignitatis stridentia tingunt aera membrana dignitatis &

    What is DC Sputtering?DC or Direct Current Sputtering is a Thin Film Physical Vapor Deposition (PVD) Coating technique where a target material to be used as the coating is bombarded with ionized gas molecules causing atoms to be “Sputtered” off into the plasma. These vaporized atoms are then depo...
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  • Vacuum ferri tunica introductio eget potentia copia

    In qua applicantur ad substrati pondus est negans voltage in vacuo coating processus. Terminus ad probandum per vacuum ferri potentia copia coniunctum cubiculum de cubiculo in vacuo solo coniungitur. Quod negans pondus terminum de potentia copia est coniuncta ad ...
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  • Several reasons for the fine pumping of vacuum coating machine——–Kunshan Puyuan

    Vacuum coating machine fine pumping too slow mainly from the following aspects to find the reasons for: 1、A diffusion pump may not be so awesome.Solution: the ionization gauge can be used to pump the mouth of the pump, see the pump single pumping can reach the number, to look at the time and the...
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  • Measurement and control method of film thickness of modern vacuum film coating machine

        The most direct coating control method is the quartz crystal micro balance method (QCM), which can be directly driven by the evaporation source, through the PID control loop drive baffle, keep the evaporation rate. As long as the instrument is connected with the system control software, it ca...
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  • Ion Plating

    Has a variety of coating method used in modern aviation industry, such as electroplating, plating, electroless plating, spreading and rolling pressure, plating, etc.Many coating process for people to grasp, and played a significant role in the production.However, the existing coating process with...
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  • MAGNETRON SPUTTERING

    Magnetron sputtering is a deposition technology involving a gaseous plasma which is generated and confined to a space containing the material to be deposited – the ‘target’. The surface of the target is eroded by high-energy ions within the plasma, and the liberated atoms travel through the vac...
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  • PVD Properties and Application Chart

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  • The Advantages of PVD Wear Coatings

    Dramatic Improvement in Tool Life Minimal Dimensional Changes Low Maintenance Higher Speeds & Feeds Protects Against Corrosion Strip & Recoat Multiple Times Resistant to Chemicals Environmentally Safe High Heat Resistance Reduced Friction Uniform Coating Decorative Colors Low Coa...
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  • Quid PVD uti vacuum apparatus membrana dignitatis?

    Quid PVD uti vacuum apparatus membrana dignitatis?

    Ad alia arte, sicut traditional electroplating depositione scripto redegit, PVD vacui externo technology habet multa commoda, sicut potest, quam impetro magis ac magis amet pede renititur cuticularia applicantur ad electroplating processus. Aedibus partibus artibus habent bonum, et caliditas summa vi impulsum, ex ...
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  • Vacuum apparatus membrana dignitatis tutela

    Vacuum apparatus membrana dignitatis tutela

    Cum progressum scientiae andtechnology, vacuum membrana dignitatis technology fuerit in solis scelerisque arguentis, solis cellulis, in infulis tantam orbis, semiconductor cogitationes, vitrum, optica, photoelectricdisplay fabrica, fingunt, et concidens instrumentum est difficile membrana dignitatis, scelerisque membrana dignitatis ofturbine ferrum, metalli products , exc ...
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  • processus PVD

    Membrana coating processus technology et technology quod processus processus et technology membrana coating processus 1. technology ac vacui externo technology progressus vacuo membrana dignitatis technology, non diu ut satus est, civitas gentium in in sixties ultima saeculo ante CVD (Chemic ...
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  • Vacuum ferri tunica introductio eget potentia copia

    In qua applicantur ad substrati pondus est negans voltage in vacuo coating processus. Terminus ad probandum per vacuum ferri potentia copia coniunctum cubiculum de cubiculo in vacuo solo coniungitur. Quod negans pondus terminum de potentia copia est coniuncta ad ...
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