The operating principle of magnetron sputtering of series CJ magnetron sputtering vacuum membrane plate machine: the so-called “sputtering” is using the energetic particle (the gas positive ion is used generally) to bombard the object so as to cause the phenomenon of the surface atom of the objective escaping from the parent. As far back as 1842, Grove had found this phenomenon in the laboratory. The magnetron sputtering target adopts the static electromagnetic field, which is curvilinear, while the plane target and cylindrical target adopt the uniform electric field and logarithm electric field respectively. Under effect of the electric field, the electron will collide with the argon atom in the process of accelerating flying to the substrate. When the electron has enough energy (about 30ev), Ar+ will be ionized and the electron will be produced and fly to the substrate; under effect of the electric field, Ar+ will accelerate flying to the cathode (the sputtering target) and bombard the surface of the target with high energy and make the target sputtering.
It is widely used in electrical appliances, watch & clock, golf head, arts and crafts, toys, lights reflectors, phone keypad housing and instrumentation, plastics, glass, ceramics, tiles and other surface decorative coating film and functional coating of tool and mould. It has the irreplaceable advantages in areas of coated ultra-black film, gold decoration film and conductive film.
1) Good film thickness controllability and repeatability. The predetermined thickness of film can be reliably coated, and the sputtering coating film can be obtained with uniform thickness film layer on the large surface;
2) Strong adhesion of the film and the substrate. Some of the high energy of the sputtered atoms generates the different degrees of incidence phenomenon, forming a layer of pseudo-diffusion layer that sputtered atoms fused to the substrate atoms each other;
3) Prepare a film made by special material, different materials may be used to sputter and prepare a mixed film and compound film, and also a Tin imitation gold film can be sputtered;
4) High purity with film layer, the sputtering film layer will not be mixed with components of crucible heater material.
4) It is equipped with a low-temperature auxiliary ion beam source, directly cool coat the film at room temperature without heating, energy saving and productivity improvement.
|Pumping speed||It will take less than 10 minutes from air pump to 9*10-3Pa|
|Pressure rising rate||0.67Pa/h|
|Target||Cylindrical or planar targets 1 – 12PCS|
|Target power||10 – 60KW DC or Mid-frequency 1 – 12sets|
|Pump||Diffusion pump or molecular pump|
|Work frame||It can be customized designed，public rotation，rotation speed can be controlled|
|Gas||Precision meter control 1-4 road work gas|
|Control mode||Manual, semi-automatic and fully automatic control; Control panel use Chinese and English language|